Wafer holding is basically vacuum suction or edge-clamp.
The internal mini-environment cleanliness control is verified by the CFD analysis, which ensures the internal and external pressure-differential design to prevent from pollution during the wafer transfer process.
The compact design can reduce footprint and saves costs.
Optimized moving track of the robot, enabling a speedy and stable transfer with the curve interpolation for the shortest route.
LOAD PORT configuation capability from 2 to 8 ports.
Optional with the high-speed wafer pre-aligner, which uses the dynamic image algorithm, can accurately and quickly allocate the wafer center and direction.
Optional with the optical and image processing & identification system, enhances the identification rate of wafer ID.
Complete data track to satisfy the requirement of predictive maintenance of Industry 4.0.
Customized services, providing discussions for customized specifications.